Model for the trap-assisted tunnelling current through very thin SiO2/ZrO2gate dielectric stacks
Author:
Publisher
IOP Publishing
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Dielectric properties of Ta2O5–ZrO2 polycrystalline ceramics
2. Nitrogen plasma annealing for low temperature Ta2O5 films
3. Electrical characteristics of metal-dielectric-metal and metal-dielectric-semiconductor structures based on electron beam evaporated Y2O3, Ta2O5 and Al2O3 thin film
4. Hafnium and zirconium silicates for advanced gate dielectrics
5. High-resolution depth profiling in ultrathin Al2O3 films on Si
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