Machine learning for inverse lithography: using stochastic gradient descent for robust photomask synthesis
Author:
Publisher
IOP Publishing
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference36 articles.
1. Resolution Enhancement Techniques in Optical Lithography
2. Optimal binary image design for optical lithography
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4. Binary image synthesis using mixed linear integer programming
5. Phase-shifting masks for microlithography: automated design and mask requirements
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