Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
81 articles.
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1. Inverse Lithography with Adaptive Mask Complexity;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
2. Inverse lithography physics-informed deep neural level set for mask optimization;Applied Optics;2023-11-15
3. A GPU-Enabled Level-Set Method for Mask Optimization;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-02
4. Hotspot Prediction: SEM Image Generation With Potential Lithography Hotspots;IEEE Transactions on Semiconductor Manufacturing;2023
5. Mask optimization method based on residual network;2nd International Conference on Laser, Optics and Optoelectronic Technology (LOPET 2022);2022-10-14