Analysis of local electrical properties of grain boundaries in Si by electron-beam-induced-current techniques
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,General Materials Science
Link
http://stacks.iop.org/0953-8984/14/i=48/a=364/pdf
Reference10 articles.
1. Influence of copper contamination on recombination activity of misfit dislocations in SiGe/Si epilayers: Temperature dependence of activity as a marker characterizing the contamination level
2. Recombination activity of contaminated dislocations in silicon: A model describing electron-beam-induced current contrast behavior
3. Scanning electron microscope charge‐collection images of grain boundaries
4. Theory of beam induced current characterization of grain boundaries in polycrystalline solar cells
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