Thermal stability of tantalum nitride based thin film resistors
Author:
Publisher
IOP Publishing
Subject
General Medicine
Link
http://stacks.iop.org/1757-899X/498/i=1/a=012014/pdf
Reference13 articles.
1. Reactive sputter deposition and properties of TaxN thin films
2. Structural and electrical characterization of tantalum nitride thin film resistors deposited on AlN substrates for π-type attenuator applications
3. Growth of Tantalum Nitride Films on Si by Radio Frequency Reactive Sputtering of Ta in N[sub 2]/Ar Gas Mixtures: Effect of Bias
4. Structural and electrical properties of Ta and Ta nitrides deposited by chemical vapour deposition
5. Comparison of the diffusion barrier properties of chemical‐vapor‐deposited TaN and sputtered TaN between Cu and Si
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1. Electrocatalytic activity, phase kinetics, spectroscopic advancements, and photocorrosion behaviour in tantalum nitride phases;Nano Energy;2024-10
2. Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors;Surfaces and Interfaces;2024-03
3. Growth Mechanisms of TaN Thin Films Produced by DC Magnetron Sputtering on 304 Steel Substrates and Their Influence on the Corrosion Resistance;Coatings;2022-07-11
4. Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering;Applied Physics A;2022-04-16
5. Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates;Coatings;2021-08-05
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