Structural and electrical characterization of tantalum nitride thin film resistors deposited on AlN substrates for π-type attenuator applications
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference9 articles.
1. Properties of reactively sputter-deposited TaN thin films
2. Reactive sputter deposition and characterization of tantalum nitride thin films
3. Preparation of thin film resistors with low resistivity and low TCR by heat treatment of multilayered Cu/Ni deposits
4. Stress, resistance, and phase transitions in NiCr(60 wt %) thin films
5. Reactive sputter deposition and properties of TaxN thin films
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