Structural and electrical properties of Ta and Ta nitrides deposited by chemical vapour deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference14 articles.
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4. Proc. Electronics Components Conf.;Gerstenberg,1962
5. X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixtures
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