X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixtures-Reference-Cited by-同舟云学术

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X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixtures

Published:1973-01 Issue:1 Volume:15 Page:15-30
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Westwood W.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. A.S.T.M. Powder Diffraction file No. 4-0788.

2. A NEW STRUCTURE IN TANTALUM THIN FILMS

3. Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics

4. A very pure thin film tantalum phase

5. Phase composition and conductivity of sputtered tantalum

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Structure of β-Tantalum Nanocrystallites;Microscopy and Microanalysis;2005-11-15

2. X-Ray Characterization of Magnetic Multilayers and Superlattices;NATO ASI Series;1991

3. Fabrication and structure of Mo/Ta superlattices;Journal of Applied Physics;1988-03-15

4. Epitaxial growth and X-ray diffraction analysis of single-crystal thin films of CuCl;Solid State Communications;1986-05

5. Inherent ductility in amorphous Ta2O5 films;Journal of Materials Science;1984-12

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