Optical properties of pulsed dc magnetron sputtered thin film tantalum nitride by spectroscopic ellipsometry

Author:

Shrestha Bishal1ORCID,Jaszewski Samantha T.2ORCID,Ihlefeld Jon F.2ORCID,Wolfley Steve L.23ORCID,David Henry M.23ORCID,Podraza Nikolas J.1ORCID

Affiliation:

1. Department of Physics and Astronomy and Wright Centre for Photovoltaics Innovation and Commercialization, University of Toledo 1 , 2801 W. Bancroft Street, Mailstop 111, Toledo, Ohio 43606

2. Department of Materials Science and Engineering, University of Virginia 2 , 395 McCormick Road, Charlottesville, Virginia 22904

3. Sandia National Laboratories 3 , 1515 Eubank SE, Albuquerque, New Mexico 87123

Abstract

Ellipsometric spectra of polycrystalline thin film tantalum nitride (TaN) have been collected and analyzed to obtain the complex dielectric function (ɛ = ɛ1 + iɛ2) and complex refractive index (N = n + ik) spectra over the photon energy range of 0.059–8.500 eV. Complex optical properties are obtained for TaN in the as-deposited state and rapid thermal annealed at 750 °C for 30 s post deposition. A parametric expression including the contribution from intraband and interband transitions along with a structural model is used and fitted to experimental ellipsometric spectra using iterative least-square regression, which minimizes the unweighted error function or mean square error to extract complex optical properties. The parametric expression developed in this work is successful in describing and differentiating the optical response of measured as-deposited and annealed TaN films and can potentially be used to analyze the optical properties of similar TaN films regardless of their deposition techniques.

Funder

Air Force Research Laboratory

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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