Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors-Reference-Cited by-同舟云学术

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Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors

Published:2024-03 Issue: Volume:46 Page:104088
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Zhang Mingzhen,Wang Yue,Song Shangzhi,Guo Ruiqiang^ORCID,Zhang Wenbin^ORCID,Li Chengming,Wei Junjun,Jiang Puqing^ORCID,Yang Ronggui

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference32 articles.

1. Wear and corrosion characteristics of nano-crystalline tantalum nitride coatings deposited on CoCrMo alloy for hip joint applications;Corona-Gomez;Mater. Charact.,2021

2. Structural properties and corrosion resistance of tantalum nitride coatings produced by reactive DC magnetron sputtering;Alishahi;RSC Adv,2016

3. Comparative study of tantalum and tantalum nitrides (Ta2N and TaN) as a diffusion barrier for Cu metallization;Min;J. Vac. Sci. Technol. B: Microelectron. Nanomet. Struct. Process. Measurem. Phenom.,1996

4. Diffusion barrier properties of single- and multilayered quasi-amorphous tantalum nitride thin films against copper penetration;Chen;J. Appl. Phys.,2000

5. Characterization of tantalum nitride thin films deposited on SiO2 ∕ Si substrates using dc magnetron sputtering for thin film resistors;Cuong;J. Electrochem. Soc.,2006

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