Abstract
Abstract
This paper presents a transmission-gate-based 10T (TG10T) subthreshold SRAM cell for internet of things applications. To estimate its relative strength, it is compared with six-transistor (6T), transmission gate (TG)-based 8T (TG8T), and fully differential 8T (FD8T) cells subjected to severe process variations. The simulation results are carried out using HSPICE software and a 16 nm CMOS technology node. The TG10T cell uses a differential scheme to enhance the sense margin, two TGs instead of two NMOS access transistors to enhance write-ability, and two extra buffer transistors to improve read stability. The proposed TG10T cell minimizes leakage power dissipation by means of a greater number of PMOS devices. The proposed cell shows at least a 1.67X lower read delay (T
RA) and a 1.13X higher read static noise margin. In addition, it offers a 1.22X and 1.52X lower write delay (T
WA), and a 1.36X and 1.40X higher write static noise margin (WSNM) than that of 6T and FD8T, respectively. The TG10T cell consumes 2.06X/1.28X lower dynamic/leakage power compared to the 6T cell. For all these improvements, it incurs a penalty of 1.24X T
WA, 1.48X WSNM, and 1.12Xdynamic power when compared with the TG8T cell, at V
DD = 0.36 V. However, when subjected to severe process variations, the proposed TG10T cell shows high reliability. Moreover, a 2 kb SRAM memory using the proposed TG10T cell along with peripheral circuitries is implemented to evaluate the proposed cell’s performance in an array level.
Funder
Babol Noshirvani University of Technology
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
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