Power supply for mid-frequency magnetron sputtering with a wide-range control of pulses parameters

Abstract

Abstract The paper presents a description of a pulsed power supply of a magnetron sputtering system with a power of 10 kW, which has a wide range of output parameters, such as the amplitude, the frequency, and duration of voltage pulses. High values of the pulse current (up to 100 A) and voltage (up to 1800 V) provide the ability to work at low duty cycle, which in turn allows to increase the value of the ion current on the substrate. It has been experimentally found, that changing the frequency and duration of the pulses can increase the ion current density to the substrate while maintaining the average discharge power.