Cleaning of wafer edge, bevel and back-side with a torus-shaped capacitively coupled plasma-Reference-Cited by-同舟云学术

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Cleaning of wafer edge, bevel and back-side with a torus-shaped capacitively coupled plasma

Published:2002-11-01 Issue:4 Volume:11 Page:520-524
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Jeon Buil,Chang Hong-Young,Song Jong-Kyu,Jeon Chang-Won

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference4 articles.

1. The cleaning at a back surface and edge of a wafer for introducing Cu metallization process

2. Capacitively coupled glow discharges at frequencies above 13.56 MHz

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