Control of electron energy distribution by adding a pulse inductive field in capacitive discharge
Author:
Funder
Research Foundation of Korea grant funded by the Korea government
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/23/i=6/a=062002/pdf
Reference38 articles.
1. Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
2. Novel radio‐frequency induction plasma processing techniques
3. Principles of Plasma Discharges and Materials Processing
4. Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma
5. Driving frequency effect on electron heating mode transition in capacitive discharge
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Mutual influence of the channels in a combined discharge based on the RF inductive and DC discharges;Vacuum;2022-04
2. Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias;Physics of Plasmas;2021-06
3. Time-resolved radial uniformity of pulse-modulated inductively coupled O2/Ar plasmas*;Chinese Physics B;2021-05-01
4. Radially localized electron heating in helicon plasmas by X-wave microwave injection;Physics of Plasmas;2021-02
5. Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating;Physics of Plasmas;2020-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3