Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias-Reference-Cited by-同舟云学术

Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias

Published:2021-06 Issue:6 Volume:28 Page:063504
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Yoon Min Young¹²^ORCID,Yeom H. J.¹³^ORCID,Kim Jung Hyung¹^ORCID,Chegal Won¹^ORCID,Cho Yong Jai¹^ORCID,Kwon Deuk-Chul⁴^ORCID,Jeong Jong-Ryul²^ORCID,Lee Hyo-Chang¹⁵^ORCID

Affiliation:

1. Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea

2. Department of Materials Science and Engineering, Chungnam National University, Daejeon 34134, Republic of Korea

3. Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea

4. Korea Institute of Fusion Energy (KFE), Gunsan 54004, Republic of Korea

5. Department of Electrical Engineering, Hanyang University, Seoul 04763, Republic of Korea

Funder

Material Innovation Program

R&D Convergence Program

KRISS research program

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0047811

Reference117 articles.

1. Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

2. The Cutting Edge of Plasma Etching

3. Process Technology Variation

4. High aspect ratio silicon etch: A review

5. Silicon Device Scaling to the Sub-10-nm Regime

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Damage-Free Plasma Source for Atomic-Scale Processing;Nano Letters;2024-09-06

2. Effect of radiofrequency bias power on transmission spectrum of flat-cutoff sensor in inductively coupled plasma;Physics of Plasmas;2024-09-01

3. Formation of YOF on Y2O3 through surface modification with NH4F and its plasma-resistance behavior;Ceramics International;2024-09

4. Effect of probe structure on wave transmission spectra of microwave cutoff probe;Journal of Applied Physics;2024-08-28

5. Transmission spectrum analysis of ceramic-shielded microwave cutoff probes in low-pressure plasmas;Journal of Applied Physics;2024-06-13