RF discharge under the influence of a transverse magnetic field
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference28 articles.
1. Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma
2. Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher
3. Optimization of plasma density and radial uniformity of a point-cusp magnetic field applied capacitive plasma
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