Global (volume-averaged) model of inductively coupled chlorine plasma: Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas-Reference-Cited by-同舟云学术

Global (volume-averaged) model of inductively coupled chlorine plasma: Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas

Published:2014-06-12 Issue:4 Volume:23 Page:045002
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Kemaneci Efe,Carbone Emile,Booth Jean-Paul,Graef Wouter,van Dijk Jan,Kroesen Gerrit

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/23/i=4/a=045002/pdf

Reference62 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Alternating fluxes of positive and negative ions from an ion–ion plasma

3. Two-dimensional pulsed-plasma simulation of a chlorine discharge

4. Analysis of pulsed high-density HBr and Cl2 plasmas: Impact of the pulsing parameters on the radical densities

5. Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A global plasma and surface model of hydrogen/methane inductively coupled discharge to analyze hydrocarbon plasma–surface interactions in extreme-ultraviolet lithography machines;Journal of Applied Physics;2024-07-22

2. Plasma properties and discharging of dust particles in an Ar/C₂H₂ plasma afterglow;Journal of Physics D: Applied Physics;2024-01-16

3. Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmas;Journal of Vacuum Science & Technology B;2023-01

4. On the chemistry mechanism for low-pressure chlorine process plasmas;Journal of Vacuum Science & Technology B;2022-09

5. Spatially averaged ion temperature model for low-temperature plasma sources;Journal of Physics D: Applied Physics;2022-08-18