Alternating fluxes of positive and negative ions from an ion–ion plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1338500
Reference13 articles.
1. Charging of pattern features during plasma etching
2. The influence of electron temperature on pattern-dependent charging during etching in high-density plasmas
3. Prediction of multiple-feature effects in plasma etching
4. Reduction of Electron Shading Damage Using Synchronous Bias in Pulsed Plasma
5. Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine
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