2D fluid model analysis for the effect of 3D gas flow on a capacitively coupled plasma deposition reactor-Reference-Cited by-同舟云学术

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2D fluid model analysis for the effect of 3D gas flow on a capacitively coupled plasma deposition reactor

Published:2016-04-06 Issue:3 Volume:25 Page:035006
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Kim Ho Jun,Lee Hae June

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/25/i=3/a=035006/pdf

Reference52 articles.

1. Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures

2. Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma

3. Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3using a Monte Carlo‐fluid hybrid model

4. Deposition of SiOxfilms with a capacitively-coupled plasma at atmospheric pressure

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