Modes of low-pressure dual-frequency (27/2 MHz) discharges in hydrogen
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference38 articles.
1. Dual excitation reactive ion etcher for low energy plasma processing
2. High selectivity plasma etching of silicon dioxide with a dual frequency 27/2 MHz capacitive radio frequency discharge
3. Observation of surface reaction layers formed in highly selective SiO2 etching
4. Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4
5. SiO2 etching with perfluorobutadiene in a dual frequency plasma reactor
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1. Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model;Chinese Physics B;2017-12
2. Comment on 'Sheath model for dual-frequency capacitive discharges';Journal of Physics D: Applied Physics;2015-06-08
3. Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O2discharges;Journal of Physics D: Applied Physics;2013-05-17
4. Abnormal Enhancement of N2+Emission Induced by Lower Frequency in N2Dual-Frequency Capacitively Coupled Plasmas;Plasma Science and Technology;2012-03
5. Experimental and theoretical study of dynamic effects in low-frequency capacitively coupled discharges;Journal of Physics D: Applied Physics;2011-12-09
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