Comment on 'Sheath model for dual-frequency capacitive discharges'-Reference-Cited by-同舟云学术

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Comment on 'Sheath model for dual-frequency capacitive discharges'

Published:2015-06-08 Issue:26 Volume:48 Page:268001
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Chen Wen-Cong,Pu Yi-Kang

Funder

Ministry of Science and Technology of China

Samsung Electronics Co. Ltd.

Advanced Micro-Fabrication Equipment Inc.

National Natural Science Foundation of China

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/48/i=26/a=268001/pdf

Reference16 articles.

1. Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices

2. Ion behavior in capacitively-coupled dual-frequency discharges

3. Space and phase resolved ion energy and angular distributions in single- and dual-frequency capacitively coupled plasmas

4. Modelling of the dual frequency capacitive sheath in the intermediate pressure range

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