Ion behavior in capacitively-coupled dual-frequency discharges
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/86/i=1/a=012011/pdf
Reference30 articles.
1. Plasma Electronics
2. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
3. Diagnostics of a wafer interface of a pulsed two-frequency capacitively coupled plasma for oxide etching by emission selected computerized tomography
4. Functional separation in two frequency operation of an inductively coupled plasma
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