Effect of driving frequency on plasma property in radio frequency and very high frequency magnetron sputtering discharges
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/23/i=1/a=015003/pdf
Reference49 articles.
1. Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices
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2. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge;Plasma Science and Technology;2022-01-17
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