Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2945890
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1. Dual excitation reactive ion etcher for low energy plasma processing
2. High selectivity plasma etching of silicon dioxide with a dual frequency 27/2 MHz capacitive radio frequency discharge
3. Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4
4. SiO2 etching with perfluorobutadiene in a dual frequency plasma reactor
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