Application of inductively coupled plasma to CVD and PVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition
2. The effect of the substrate bias voltage and the deposition pressure on the properties of diamond-like carbon produced by inductively coupled plasma assisted chemical vapor deposition
3. Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma
4. A neutron and X-ray diffraction study of the influence of deposition conditions on the structure of a-C:H
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