Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Application of a low-pressure radio frequency discharge source to polysilicon gate etching
2. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus
3. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
4. Physics of Thin Films, vol. 18;Lieberman,1994
5. Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
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