Growth and dielectric properties of tetragonal ZrO2films by limited reaction sputtering
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/41/i=17/a=175414/pdf
Reference19 articles.
1. High dielectric constant oxides
2. Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
3. A review of gate tunneling current in MOS devices
4. High-κ gate dielectrics: Current status and materials properties considerations
5. Ultrathin zirconium oxide films as alternative gate dielectrics
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