Comment on ‘Effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl4/H2plasma’
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/40/i=9/a=N01/pdf
Reference10 articles.
1. Effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl4/H2plasma
2. A Movable Mass Spectroscopy Sampling Apparatus for Measuring Spatial Distribution of Neutral Radicals in Silane Plasma
3. Mono‐ and disilicon radicals in silane and silane‐argon dc discharges
4. Appearance mass spectrometry of neutral radicals in radio frequency plasmas
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ion energy distributions for the identification of active species and processes in low pressure hollow cathode discharges;Plasma Sources Science and Technology;2009-07-15
2. Reply to “Comment on ‘Effects of hydrogen dilution on the deposition process of nano-crystalline silicon film by SiCl4/H2 plasma’”;Journal of Physics D: Applied Physics;2007-04-19
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