Reply to “Comment on ‘Effects of hydrogen dilution on the deposition process of nano-crystalline silicon film by SiCl4/H2 plasma’”
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/40/i=9/a=N02/pdf
Reference19 articles.
1. Effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl4/H2plasma
2. Comment on ‘Effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl4/H2plasma’
3. Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
4. Laser-Induced-Fluorescence Detection of SiH2Radicals in a Radio-Frequency Silane Plasma
5. Identification of Si and SiH in catalytic chemical vapor deposition of SiH4 by laser induced fluorescence spectroscopy
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