Pinch plasma EUV source with particle injection
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/37/i=23/a=008/pdf
Reference25 articles.
1. Progress of the EUVL alpha tool
2. Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
3. EUV (13.5-nm) light generation using a dense plasma focus device
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5. Star pinch scalable EUV source
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2. Improvement of power, efficiency, and cost of ownership in the tin LPP EUV source;SPIE Proceedings;2017-03-24
3. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05
4. Investigation of the dynamics of theZ-pinch imploding plasma for a laser-assisted discharge-produced Sn plasma EUV source;Journal of Physics D: Applied Physics;2011-03-22
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