Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma-Reference-Cited by-同舟云学术

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Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma

Published:1999-09-01 Issue:25 Volume:38 Page:5413
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Bergmann Klaus,Schriever Guido,Rosier Oliver,Müller Martin,Neff Willi,Lebert Rainer

Publisher

The Optical Society

Reference17 articles.

1. Wavelength considerations in soft-x-ray projection lithography

2. Multilayer coated reflective optics for Extreme UV lithography

3. Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet

4. Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

5. Diffraction-limited soft-x-ray projection imaging using a laser plasma source

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4. High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments;37th European Mask and Lithography Conference;2022-11-01

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