Wavelength considerations in soft-x-ray projection lithography-Reference-Cited by-同舟云学术

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Wavelength considerations in soft-x-ray projection lithography

Published:1993-12-01 Issue:34 Volume:32 Page:7062
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Hawryluk Andrew M.,Ceglio Natale M.

Publisher

The Optical Society

Reference2 articles.

1. Resolution limits of optical lithography

2. High-energy lithography illumination by Oxford’s synchrotron: A compact superconducting synchrotron x-ray source

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