Improvement of power, efficiency, and cost of ownership in the tin LPP EUV source

Author:

McGeoch Malcolm W.1

Affiliation:

1. PLEX LLC (United States)

Publisher

SPIE

Reference16 articles.

1. Power scaling of the tin LPP source via an argon cusp plasma;McGeoch,2014

2. Test of an Argon Cusp Plasma for Tin LPP Power Scaling;McGeoch,2015

3. Tin LPP Plasma Control in the Argon Cusp Source;McGeoch,2016

4. Further improvement of CE up to 6-8% and B-field mitigation of fast ions;Nishihara,2007

5. Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

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