Author:
Nishihara Katsunobu,Sunahara Atsushi,Sasaki Akira,Nunami Masanori,Tanuma Hajime,Fujioka Shinsuke,Shimada Yoshinori,Fujima Kazumi,Furukawa Hiroyuki,Kato Takako,Koike Fumihiro,More Richard,Murakami Masakatsu,Nishikawa Takeshi,Zhakhovskii Vasilii,Gamata Kouhei,Takata Akira,Ueda Hirofumi,Nishimura Hiroaki,Izawa Yasukazu,Miyanaga Noriaki,Mima Kunoki
Reference48 articles.
1. Plasma sources for EUV lithography exposure tools
2. Plasma sources for EUV lithography exposure tools
3. Y. Watanabe, K. Ota, H. Franken, and V. Banine, in Proceedings of the EUV Source Workshop, San Diego, 2005 (International SEMATEC, Austin, 2005), p. 1, www.sematech.org/meetings.
4. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime
5. Detailed space-resolved characterization of a laser-plasma soft-x-ray source at 135-nm wavelength with tin and its oxides
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