Next-generation lithography for 22 and 16 nm technology nodes and beyond
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Computer Science
Link
http://link.springer.com/content/pdf/10.1007/s11432-011-4227-6.pdf
Reference159 articles.
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3. Bjorkholm J E, Bokor J, Eichner L, et al. Reduction imaging at 14 nm using multilayer-coated optics—printing of features smaller than 0.1-mu-m. J Vac Sci Tech B, 1990, 8: 1509–1513
4. Wu B, Kumar A. Extreme Ultraviolet Lithography. New York: McGraw-Hill, 2009
5. Bakshi V. EUV Lithography. Bellingham, WA: SPIE Press, 2008
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