The effect of VUV radiation from Ar/O2plasmas on low-kSiOCH films
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference33 articles.
1. Low dielectric constant materials for microelectronics
2. Impact of reductive N2∕H2 plasma on porous low-dielectric constant SiCOH thin films
3. Mechanistic study of plasma damage of low k dielectric surfaces
4. Effect of plasma treatments on ultra low-k material properties
5. Effects of Plasma Exposure on SiCOH and Methyl Silsesquioxane Films
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