Effects of Plasma Exposure on SiCOH and Methyl Silsesquioxane Films
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference37 articles.
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3. Investigation of O2 and SF6 plasma interactions on thermally stable damage resistant poly phenyl-methyl silsesquioxane low-k films;Journal of Physics D: Applied Physics;2014-02-19
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