A complex x-ray characterization of epitaxially grown high-Kgate dielectrics
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/38/i=10A/a=034/pdf
Reference14 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Epitaxial praseodymium oxide: a new high-K dielectric
3. Initial stages of praseodymium oxide film formation on Si()
4. Interfacial reactions between thin rare-earth-metal oxide films and Si substrates
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