Traceable thickness measurement of ultra-thin HfO2 films by medium-energy ion scattering spectroscopy-Reference-Cited by-同舟云学术

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Traceable thickness measurement of ultra-thin HfO2 films by medium-energy ion scattering spectroscopy

Published:2020-02-12 Issue:2 Volume:57 Page:025001
ISSN:0026-1394
Container-title:Metrologia
language:
Short-container-title:Metrologia

Author:

Kim Kyung Joong^ORCID,Kim Tae Gun^ORCID,Kwon Ji-Hwan,Ruh Hyun,Park Kyungsu,Min Won Ja

Publisher

IOP Publishing

Subject

General Engineering

Link

http://iopscience.iop.org/article/10.1088/1681-7575/ab57f0/pdf

Reference21 articles.

1. Ultra-thin SiO2on Si IX: absolute measurements of the amount of silicon oxide as a thickness of SiO2on Si

2. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study

3. Ultrathin SiO2 on Si. VI. Evaluation of uncertainties in thickness measurement using XPS

4. Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness

5. CCQM-K32 key comparison and P84 pilot study: Amount of silicon oxide as a thickness of SiO2on Si

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1. Standard-Deviation-Based Adaptive Median Filter for Elimination of Batwing Effects in Step Microstructure Measurement Using Digital Holography;Sensors;2024-09-12

2. 样品倾转角度对透射电镜表征纳米薄膜的影响;Acta Optica Sinica;2024

3. Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO2 thin films on H-/OH-terminated Si (100) surfaces;Journal of Vacuum Science & Technology B;2023-09-28

4. Review on the thickness measurement of ultrathin oxide films by mutual calibration method;Surface and Interface Analysis;2021-12

5. Calibration of high magnification in the measurement of critical dimension by AFM and SEM;Applied Surface Science;2021-11

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