Controlling plasma properties under differing degrees of electronegativity using odd harmonic dual frequency excitation
Author:
Funder
Engineering and Physical Sciences Research Council
Department for Employment and Learning, Northern Ireland
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/aa8dcd/pdf
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1. Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms
2. Key plasma parameters for nanometric precision etching of Si films in chlorine discharges
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