Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4866693
Reference21 articles.
1. Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms
2. On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric
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