‘Virtual IED sensor’ for df rf CCP discharges
Author:
Funder
Russian Foundation for Basic Research
Interdisciplinary Scientific and Educational School of Moscow University
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
https://iopscience.iop.org/article/10.1088/1361-6595/abf71b/pdf
Reference52 articles.
1. Dual excitation reactive ion etcher for low energy plasma processing
2. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma
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4. Experimental and theoretical study of RF plasma at low and high frequency
5. A method for computing ion energy distributions for multifrequency capacitive discharges
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