A method for computing ion energy distributions for multifrequency capacitive discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2435975
Reference14 articles.
1. Ion energy distributions in rf sheaths; review, analysis and simulation
2. Anomalies of the Energy of Positive Ions Extracted from High‐Frequency Ion Sources. A Theoretical Study
3. Principles of Plasma Discharges and Materials Processing
4. Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
5. Ion energy distribution control in single and dual frequency capacitive plasma sources
Cited by 50 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications;Japanese Journal of Applied Physics;2024-08-01
2. The effects of magnetic field and negative DC voltage on the capacitive argon discharge;Journal of Applied Physics;2023-11-15
3. Experimental investigation of the radially-dependent ignition process in a pulsed capacitively coupled RF discharge: Effects of pressure, voltage and afterglow duration;Physica Scripta;2023-03-13
4. Electron density and temperature of dual-frequency capacitively coupled argon plasma in two-dimensional distribution obtained and studied in experiment;Journal of Vacuum Science & Technology B;2022-09
5. Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation *;Plasma Sources Science and Technology;2022-08-30
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3