Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation

Published:2021-07-01 Issue:7 Volume:30 Page:075031
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Wang Jun-Chieh,Tian Peng^ORCID,Kenney Jason,Rauf Shahid^ORCID,Korolov Ihor^ORCID,Schulze Julian^ORCID

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

https://iopscience.iop.org/article/10.1088/1361-6595/ac0da4/pdf

Reference58 articles.

1. Plasma etching: Yesterday, today, and tomorrow

2. Formation mechanism of sidewall striation in high-aspect-ratio hole etching

3. High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics

4. Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

5. The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Time-resolved laser-induced fluorescence spectroscopy using CW diode laser for diagnostics of argon-ion velocity distribution near AC-biased electrode;Review of Scientific Instruments;2024-05-01

2. Uniformity of low-pressure capacitively coupled plasmas: Experiments and two-dimensional particle-in-cell simulations;Physics of Plasmas;2024-04-01

3. Low-frequency dependence of plasma characteristics in dual-frequency capacitively coupled plasma sources;Applied Physics Letters;2024-02-05

4. Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas;AIP Advances;2024-01-01

5. Similarity laws for two-dimensional simulations of low-pressure capacitively coupled radio-frequency discharges;Physics of Plasmas;2023-12-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3