Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features
Author:
Affiliation:
1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122
2. Lam Research Corp., 4650 Cushing Parkway, Fremont, California 94538
Funder
U.S. Department of Energy (DOE)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1116/1.4973953
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