Three-dimensional model of electron beam generated plasma
Author:
Funder
Naval Research Laboratory Base Program
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/26/i=6/a=065006/pdf
Reference41 articles.
1. Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
2. Overview of atomic layer etching in the semiconductor industry
3. Atomic Layer Etching at the Tipping Point: An Overview
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