Combined experimental and theoretical description of direct current magnetron sputtering of Al by Ar and Ar/N2plasma
Author:
Funder
Deutsche Forschungsgemeinschaft
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/aac23e/pdf
Reference90 articles.
1. Efficient Low Pressure Sputtering in a Large Inverted Magnetron Suitable for Film Synthesis
2. Magnetron sputtering: basic physics and application to cylindrical magnetrons
3. A sputtering wind
4. Deposition and redeposition in magnetrons
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3. Spoke-resolved electron density, temperature and potential in direct current magnetron sputtering and HiPIMS discharges;Plasma Sources Science and Technology;2022-08-01
4. Diagnostics of a high-pressure DC magnetron argon discharge with an aluminium cathode;The European Physical Journal D;2021-09
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