Properties of the ionization region in a magnetron plasma at gas-aggregation-source-relevant pressure regime explored using a global model

Abstract

Abstract A global (volume averaged) model is developed for the ionization region (IR) of a gas aggregation source (GAS) plasma. The case of using argon gas and a copper target is considered. The model describes the densities of thermal and hot electrons, argon and copper ions, copper atoms and argon atoms in different excited states, the temperature of thermal electrons, the kinetic energies of the ions with which they bombard the target, the sheath width near the target cathode and the energy fluxes by different plasma species to a planar probe in the IR. Also, the fraction of input power is estimated which is dissipated to energize the thermal electrons in the IR. The gas discharge properties are analyzed for different pressures and discharge currents under conditions corresponding to the experimental conditions (Gauter et al 2018 J. Appl. Phys. 124 073301). The calculated pressure- and current-dependences for the GAS properties are used to explain the measured dependences for the deposition rate and the energy flux. It is found that the deposition rate increases with increasing discharge current because of the growth of currents of copper atoms and ions. With increasing pressure, the rate decreases due to drop of the densities of copper atoms and ions because of decreasing the kinetic energies of the ions with which they bombard the target. The model indicates that in the gas-aggregation-source relevant pressure regime, the energy flux by ions dominates over the energy fluxes of other plasma species.