Electron microscopy in semiconductor inspection

Author:

Nakamae KojiORCID

Abstract

Abstract Currently, semiconductor devices are manufactured in a technology node of several nanometers. Electron microscopy is mainly used in semiconductor inspection in manufacturing stages since accelerated electrons have wavelengths of nanometers or less, and a high spatial resolution can be expected. Among various electron microscopes since the scanning electron microscope (SEM) can observe the sample as it is without processing the sample, the SEM-based inspection instrument is mainly used at each stage of manufacturing the semiconductor device. The paper presents a review of SEM-based electron microscopy in semiconductor inspection. First, an overview of electron microscopy is described to understand the electron-sample interaction, the characteristics of electrons emitted from an irradiated specimen, charging, noise, and so on. Next, application areas such as mask inspection are introduced. Finally, future challenges are discussed.

Publisher

IOP Publishing

Subject

Applied Mathematics,Instrumentation,Engineering (miscellaneous)

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