Short-wavelength out-of-band EUV emission from Sn laser-produced plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Link
http://iopscience.iop.org/article/10.1088/1361-6455/aaa593/pdf
Reference38 articles.
1. Extreme ultraviolet lithography: Status and prospects
2. Physical processes in EUV sources for microlithography
3. Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
4. Key components technology update of the 250W high-power LPP-EUV light source
5. Improved reflectance and stability of Mo-Si multilayers
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2. Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma;Applied Physics Letters;2023-12-04
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4. Theoretical investigation on extreme ultraviolet radiative opacity and emissivity of Sn plasmas at local-thermodynamic equilibrium;Acta Physica Sinica;2023
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